Venturia inaequalis
NRRL 66904
Accession numbers in other collections:ID:10.3.14
Source:Wayne Jurick II,USDA-ARS
Isolated from(substrate):Apple leaf tissue
Substrate location:Geneva,New York,US
Growth media:Potato Dextrose Agar(number 3)
Optimum growth temperature:25C
Strain images:
NRRL_66904_3_reverse.JPG
NRRL_66904_3_top.JPG
Comments:Baseline sensitive
This strain is a regulated plant pathogen.An APHIS PPQ 526 permit is required for distribution in the United States.For international requests,an importation permit or an official letter from the appropriate government agency declaring that a permit is not required must be provided in advance of shipment.
